The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 13, 2026

Filed:

Mar. 23, 2023
Applicant:

Board of Trustees of Michigan State University, East Lansing, MI (US);

Inventors:

Minchul Kim, East Lansing, MI (US);

Anil K. Jain, Okemos, MI (US);

Xiaoming Liu, Okemos, MI (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06V 40/16 (2022.01); G06V 10/764 (2022.01); G06V 10/98 (2022.01);
U.S. Cl.
CPC ...
G06V 40/172 (2022.01); G06V 10/764 (2022.01); G06V 10/993 (2022.01);
Abstract

A method of training a facial recognition system with a plurality of image samples of a training set includes determining an image quality of each of the image samples in the training set, assigning a margin function to each of the image samples based on the image quality of each image sample, classifying the image samples, determining a prediction, determining a loss based on the prediction and the margin function, generating gradients based on the loss and changing weights in the classifier based on the gradients.


Find Patent Forward Citations

Kim, Minchul. (2026). Face recognition system using quality adaptive margins and method of performing the same (U.S. Patent No. 12525057). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12525057

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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