The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 13, 2026
Filed:
Jun. 30, 2023
Advanced Micro Devices, Inc., Santa Clara, CA (US);
Ati Technologies Ulc, Markham, CA;
Guennadi Riguer, Markham, CA;
Michal Adam Woźniak, Santa Clara, CA (US);
Advanced Micro Devices, Inc., Santa Clara, CA (US);
ATI Technologies ULC, Markham, CA;
Abstract
A technique for texture filtering. A transition is made from a first mipmap corresponding to a first texture resolution to a second mipmap corresponding to a second texture resolution. The first texture resolution is lower than the second texture resolution. As compared to standard trilinear filtering, initiation of the transition is delayed by an offset (or bias), which serves to delay the initial use of the second mipmap until it has been loaded. Following initiation of the transition, first and second weightings are selected with a nonlinear filter, and the system interpolates between the first mipmap and the second mipmap by applying the weightings. During an initial portion of the transition, the nonlinear filter has a slope that is higher than that of the standard trilinear filter.