The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 13, 2026

Filed:

May. 02, 2023
Applicant:

Accenture Global Solutions Limited, Dublin, IE;

Inventors:

Karthik Rajkumar Kannan, Chennai, IN;

Malek Ben Salem, Falls Church, VA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 8/77 (2018.01); G06F 8/72 (2018.01); G06F 11/3698 (2025.01); G06F 21/57 (2013.01);
U.S. Cl.
CPC ...
G06F 8/72 (2013.01); G06F 8/77 (2013.01); G06F 11/3698 (2025.01); G06F 21/577 (2013.01);
Abstract

In some examples, source code differential pruning-based dataset creation may include receiving source code that includes at least one vulnerability and at least one remediation that remediates the at least one vulnerability, extracting at least one remediated section, and identifying each sentence of the remediated section. A plurality of clusters may be generated based on an analysis of each identified sentence of the remediated section to determine a score with respect to a specified cluster that includes the identified sentence. Further, a determination may be made as to whether the score is greater than a specified threshold. Each identified sentence for which the score is greater than the specified threshold may be designated as a relevant sentence. An auxiliary dataset may be generated based on a plurality of relevant sentences and include at least one relevant vulnerability and at least one relevant remediation that remediates the relevant vulnerability.


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