The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 13, 2026

Filed:

Aug. 18, 2020
Applicant:

Nikon Corporation, Tokyo, JP;

Inventor:

Yoji Watanabe, Kumagaya, JP;

Assignee:

NIKON CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G01B 11/00 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70591 (2013.01); G01B 11/002 (2013.01);
Abstract

An exposure apparatus includes: an exposure illumination optical system illuminating a spatial light modulator which has a plurality of spatial light modulation elements having a reflecting surface disposed on a disposition plane; a projection optical system projecting light from the spatial light modulator to an exposed substrate; a first detection unit detecting light from the reflecting surface; a second detection unit which is a detection unit detecting light from the reflecting surface and has a detection field of view larger than that of the first detection unit; and a position changing mechanism changing a positional relationship among the first detection unit, the second detection unit, and the spatial light modulator to either a first positional relationship in which the spatial light modulator faces the first detection unit and a second positional relationship in which the spatial light modulator faces the second detection unit.


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