Treating arrangement with storage chamber and epitaxial reactor

Abstract

The treating arrangement () for an epitaxial reactor () comprises: a reaction chamber () for treating substrates, a transfer chamber () adjacent to the reaction chamber (), for transferring substrates placed over substrates support devices, a loading/unloading group () at least in part adjacent to the transfer chamber (), arranged to contain a substrates support device with one or more substrates, a loading/unloading chamber () at least in part adjacent to the loading/unloading group (), having a first storage zone () for treated and/or untreated substrates and a second storage zone () for substrates support devices without any substrate, at least one external robot () for transferring treated substrates, untreated substrates and substrates support devices without any substrate between said loading/unloading chamber () and said loading/unloading group (), at least one internal robot () for transferring substrates support devices with one or more substrates between said loading/unloading group () and said reaction chamber () via said transfer chamber (); wherein said external robot () comprises an articulated arm () arranged to handle both treated substrates and untreated substrates as well as substrates support devices.