The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 13, 2026
Filed:
Oct. 02, 2020
Lpe S.p.a., Baranzate, IT;
Silvio Preti, Baranzate, IT;
Francesco Corea, Baranzate, IT;
LPE S.p.A., Baranzate, IT;
Abstract
The treating arrangement () for an epitaxial reactor () comprises: a reaction chamber () for treating substrates, a transfer chamber () adjacent to the reaction chamber (), for transferring substrates placed over substrates support devices, a loading/unloading group () at least in part adjacent to the transfer chamber (), arranged to contain a substrates support device with one or more substrates, a storage chamber () containing at least in part the loading/unloading group (), having a first storage zone () for treated and/or untreated substrates and a second storage zone () for substrates support devices without any substrate, at least one external robot () for transferring treated substrates, untreated substrates and substrates support devices without any substrate between said storage chamber () and said loading/unloading group (), at least one internal robot () for transferring substrates support devices with one or more substrates between said loading/unloading group () and said reaction chamber () via said transfer chamber (); said loading/unloading group comprises a load-lock chamber (A) and a preparation station (B) associated with each other.