The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 13, 2026

Filed:

Oct. 16, 2019
Applicant:

Merck Patent Gmbh, Darmstadt, DE;

Inventors:

Kensuke Aida, Kakegawa, JP;

Atsuhiko Sato, Kakegawa, JP;

Rikio Kozaki, Kakegawa, JP;

Kazuya Arima, Kakegawa, JP;

Assignee:

Merck Patent GmbH, Darmstadt, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08K 5/092 (2006.01); C08G 77/04 (2006.01); C09D 183/04 (2006.01);
U.S. Cl.
CPC ...
C08K 5/092 (2013.01); C08G 77/04 (2013.01); C09D 183/04 (2013.01);
Abstract

To provide a polysiloxane composition capable of suppressing the generation of voids when forming a siliceous film. A polysiloxane composition comprising a polysiloxane; a dicarboxylic acid having the first acid dissociation constant pKaof 4.0 or less and represented by the following formula (II): HOOC-L-COOH (II) (wherein, L is a single bond, a hydroxy-substituted or amino-substituted alkylene having 1 to 6 carbon atoms, a substituted or unsubstituted alkenylene having 2 to 4 carbon atoms, a substituted or unsubstituted alkynylene having 2 to 4 carbon atoms, or a substituted or unsubstituted arylene having 6 to 10 carbon atoms); and a solvent.


Find Patent Forward Citations

Aida, Kensuke. (2026). Polysiloxane composition (U.S. Patent No. 12522714). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12522714

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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