The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 13, 2026
Filed:
Oct. 29, 2021
Zeon Corporation, Tokyo, JP;
Sakyo Yagyu, Tokyo, JP;
ZEON CORPORATION, Tokyo, JP;
Abstract
A method for producing hollow particles which comprise a shell and a hollow portion surrounded by the shell and which have a void ratio of 50% or more, the method comprising: preparing a mixture liquid containing a polymerizable monomer, a hydrophobic solvent, a polymerization initiator, a dispersion stabilizer and an aqueous medium, suspending the mixture liquid to prepare a suspension in which droplets or a monomer composition containing the polymerizable monomer, the hydrophobic solvent and the polymerization initiator are dispersed in the aqueous medium, and subjecting the suspension to a polymerization reaction to prepare a precursor composition containing precursor particles which have a hollow portion surrounded by a shell containing a resin and which include the hydrophobic solvent in the hollow portion, wherein the polymerizable monomer contains a crosslinkable monomer, and wherein an HOP distance between the crosslinkable monomer and the hydrophobic solvent is 5.80 to 6.50.