The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 13, 2026

Filed:

Apr. 11, 2023
Applicant:

Up Chemical Co., Ltd., Pyeongtaek-si, KR;

Inventors:

Wonyong Koh, Daejeon, KR;

Jin Sik Kim, Pyeongtaek-si, KR;

Dae-Young Kim, Pyeongtaek-si, KR;

Assignee:

UP CHEMICAL CO., LTD., Pyeongtaek-si, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C07F 15/00 (2006.01); C07F 17/02 (2006.01); C23C 16/18 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
C07F 15/0053 (2013.01); C07F 15/00 (2013.01); C07F 15/0046 (2013.01); C07F 17/02 (2013.01); C23C 16/18 (2013.01); C23C 16/45538 (2013.01);
Abstract

The present application relates to: a ruthenium precursor compound for forming a film having high thermal stability; a precursor composition for forming a film, comprising the ruthenium precursor compound; and a method for forming a ruthenium-containing film using the precursor for forming a film.


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