The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 13, 2026
Filed:
May. 29, 2023
Dalian University of Technology, Dalian, CN;
Xuehua Ruan, Dalian, CN;
Gaohong He, Dalian, CN;
Weixiang Fan, Dalian, CN;
Jiaming Wang, Dalian, CN;
Wenji Zheng, Dalian, CN;
Xiaobin Jiang, Dalian, CN;
Xiaoming Yan, Dalian, CN;
Wu Xiao, Dalian, CN;
Qinzheng He, Dalian, CN;
DALIAN UNIVERSITY OF TECHNOLOGY, Dalian, CN;
Abstract
A fabrication technique for PIM-1 asymmetric membranes doped with polyethylene glycol for gas separation includes the following steps. Firstly, the coagulation process of casting solution is regulated by polyethylene glycol to thin the dense layer, to improve the hydrophilicity of the membrane structure, and to form mass transfer channels for the diffusion of polyethylene glycol into the dense layer. Then, directional migration and enrichment of polyethylene glycol are realized through capillary action induced by directional water evaporation for fabrication of PIM-1 asymmetric membranes doped with polyethylene glycol in the dense layer for gas separation.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile