The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 13, 2026

Filed:

Aug. 20, 2021
Applicant:

Medtronic, Inc., Minneapolis, MN (US);

Inventors:

Justin R. Peterson, Santa Rosa, CA (US);

Syed J. Askari, San Jose, CA (US);

Shahnaz Javani, Santa Rosa, CA (US);

Stuart E. Kari, Windsor, CA (US);

Genevieve E. Farrar, Novato, CA (US);

Assignee:

Medtronic, Inc., Minneapolis, MN (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61F 2/24 (2006.01);
U.S. Cl.
CPC ...
A61F 2/2418 (2013.01); A61F 2/2412 (2013.01); A61F 2220/0033 (2013.01); A61F 2250/0096 (2013.01); A61F 2250/0098 (2013.01);
Abstract

A transcatheter valve prosthesis includes a stent having a crimped configuration for delivery within a vasculature and an expanded configuration for deployment within a native heart valve. The stent includes an inflow portion, an outflow portion, and at least one commissure post positioned at least partially in the outflow portion of the stent. The transcatheter valve prosthesis includes an inflow marker positioned within the inflow portion of the stent, the inflow marker including a first radiopaque material. The transcatheter valve prosthesis includes an outflow marker positioned on the at least one commissure post, the outflow marker including a second radiopaque material. The first radiopaque material and the second radiopaque material cause the inflow marker and the outflow marker to be visible relative to the stent in one or more images captured during the installation at the implant location.


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