The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 06, 2026

Filed:

Jul. 08, 2021
Applicant:

Boe Technology Group Co., Ltd., Beijing, CN;

Inventor:

Yang Lv, Beijing, CN;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10D 86/60 (2025.01); H10D 30/01 (2025.01); H10D 30/67 (2025.01); H10D 86/01 (2025.01); H10D 86/40 (2025.01);
U.S. Cl.
CPC ...
H10D 86/60 (2025.01); H10D 30/0314 (2025.01); H10D 30/0321 (2025.01); H10D 30/6731 (2025.01); H10D 30/6745 (2025.01); H10D 30/6757 (2025.01); H10D 86/0229 (2025.01); H10D 86/425 (2025.01);
Abstract

A thin film transistor includes a substrate and an active layer having a channel region. The active layer includes a first active pattern and at least one second active pattern. The first active pattern includes a bottom surface, a top surface and at least one side surface. The at least one side surface connects the bottom and top surfaces, and is in contact with the at least one second active pattern. A length direction of each side surface is approximately perpendicular to a length direction of the channel region. A material of at least the top surface of the first active pattern includes a first polysilicon material, and a material of the second active pattern includes a second polysilicon material; and in the length direction of the channel region, an average grain size of the first polysilicon material is greater than an average grain size of the second polysilicon material.


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