The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 06, 2026

Filed:

Feb. 28, 2024
Applicants:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Korea Advanced Institute of Science and Technology, Daejeon, KR;

Inventor:

Sanghun Jeon, Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10B 53/00 (2023.01); G11C 11/22 (2006.01); H10B 53/20 (2023.01); H10D 30/69 (2025.01); H10D 64/68 (2025.01);
U.S. Cl.
CPC ...
H10B 53/00 (2023.02); G11C 11/221 (2013.01); H10B 53/20 (2023.02); H10D 30/701 (2025.01); H10D 64/689 (2025.01);
Abstract

The present invention relates to ferroelectric capacitors, transistors, memory device, and method of manufacturing ferroelectric devices. The ferroelectric capacitor includes a first electrode, a second electrode facing the first electrode, a ferroelectric layer between the first electrode and the second electrode, and an interfacial layer between the ferroelectric layer and the first electrode or between the ferroelectric layer and the second electrode. The ferroelectric layer includes hafnium-based oxide. The interfacial layer includes HfO.


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Jeon, Sanghun. (2026). Ferroelectric capacitors, transistors, memory devices, and methods of manufacturing ferroelectric devices (U.S. Patent No. 12520498). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12520498

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