The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 06, 2026

Filed:

Jul. 28, 2021
Applicant:

Jusung Engineering Co., Ltd., Gwangju-Si, KR;

Inventors:

Il Hyong Cho, Gwangju-Si, KR;

Young Woon Kim, Gwangju-Si, KR;

Chul Joo Hwang, Gwangju-Si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/14 (2006.01); C23C 16/455 (2006.01); H01J 37/32 (2006.01); H01L 21/285 (2006.01);
U.S. Cl.
CPC ...
H01L 21/28568 (2013.01); C23C 16/14 (2013.01); C23C 16/45536 (2013.01); H01J 37/32449 (2013.01); H01J 2237/332 (2013.01);
Abstract

In accordance with an exemplary embodiment, a method for forming a thin film includes supplying a reducing gas onto a substrate provided in a reaction space, applying a power to generate plasma in the reaction space, and supplying a tungsten containing gas onto the substrate, and the supplying of the tungsten containing gas is intermittently performed while the reducing gas is supplied.


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