The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 06, 2026

Filed:

Oct. 05, 2022
Applicant:

Shimadzu Corporation, Kyoto, JP;

Inventor:

Keisuke Iso, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 49/16 (2006.01); G01N 30/72 (2006.01); H01J 49/04 (2006.01);
U.S. Cl.
CPC ...
H01J 49/165 (2013.01); G01N 30/7246 (2013.01); H01J 49/044 (2013.01); H01J 49/0477 (2013.01);
Abstract

In an ionization device for an ionization chamber () separated from an analysis chamber (-) by a partition wall having an ion introduction port (), an ionization probe () sprays a liquid sample. A heated-gas supply mechanism (), which includes a gas supply source and a heating section () for heating a gas supplied from the gas supply source, expels the gas in a direction intersecting with the direction in which the liquid sample is sprayed from the ionization probe. A controller () controls an operation of the heated-gas supply mechanism so that the gas is continuously expelled from the heated-gas supply mechanism regardless of the presence or absence of an operation by a user while the liquid sample is sprayed from the ionization probe. The continuous expulsion of the gas from the heated-gas supply mechanism prevents this mechanism from being contaminated by the sprayed liquid.


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