The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 06, 2026

Filed:

Jan. 22, 2021
Applicants:

Université D'aix-marseille (Amu), Marseilles, FR;

Institut National DE LA Santé ET DE LA Recherche Médicale, Paris, FR;

Inventors:

Viktor Jirsa, Aubagne, FR;

Kenza El Houssaini, Marseilles, FR;

Huifang Wang, Aubagne, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G16H 50/50 (2018.01); G16H 20/40 (2018.01);
U.S. Cl.
CPC ...
G16H 50/50 (2018.01); G16H 20/40 (2018.01);
Abstract

The method of optimizing an intracranial implantation scheme of a set of electroencephalographic electrodes for identification of an epileptogenic zone in an epileptic patient's brain includes: —providing a model of the epileptogenic zone and a model of the propagation of an epileptic discharge from the epileptic zone to a propagation zone, and loading the models in a computerized platform personalized according to the patient's brain; —providing at least one hypothesis of the localization of the epileptogenic zone in the patient brain; —for the at least hypothesis of the localization of the epileptogenic zone, simulating, in the personalized computerized patient's brain, epileptic seizures, and determining, for the hypothesis and epileptic seizures, a network of propagation zones; —for a plurality of intracranial implantation schemes of the electroencephalographic electrodes, obtaining, using the personalized computerized patient's brain, simulated electroencephalographic signals activity to be measured by the intracranial electrodes implanted according to the plurality of schemes; and —determining, from the plurality of schemes, an optimized intracranial implantation scheme of the set of electroencephalographic electrodes.


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Jirsa, Viktor. (2026). Method of optimizing an intracranial implantation scheme of a set of electroencephalographic electrodes (U.S. Patent No. 12518881). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12518881

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