The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 06, 2026

Filed:

Jan. 11, 2023
Applicant:

Accenture Global Solutions Limited, Dublin, IE;

Inventors:

Sankar Narayan Das, Barrackpore, IN;

Kuntal Dey, Birbhum, IN;

Kapil Singi, Bangalore, IN;

Vikrant Kaulgud, Pune, IN;

Sanjay Podder, Thane, IN;

Andrew Francis Hickl, Sammamish, WA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06N 20/00 (2019.01);
U.S. Cl.
CPC ...
G06N 20/00 (2019.01);
Abstract

A retraining monitoring system maintains the sustainability of a production machine learning (ML) model system that includes a production ML model retraining platform. The retraining monitoring system collects contextual data from the production ML model system and determines if one or more of a currently-selected architectural options has to be changed for sustainability. An architectural option of the production ML model retraining platform, such as, a processing location is selected from a cloud retraining platform or an on-premises retraining platform by a selection process based on a multi-armed bandit problem. An evaluation of the retraining architecture is dealt with as a reinforcement learning problem to implement one of a periodic retraining architecture or a reactive retraining architecture.


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