The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 06, 2026
Filed:
Mar. 08, 2022
Aptiv Technologies Ag, Schaffhausen, CH;
Xiuzhang Cai, Carmel, IN (US);
Bruno F. Camps Raga, Olathe, KS (US);
Alexander Ioffe, Bonn, DE;
Mohannad Saifo, Wuppertal, DE;
APTIV TECHNOLOGIES AG, Schaffhausen, CH;
Abstract
This document describes techniques and systems for an adaptive ray-launcher for an electromagnetic response simulator. An adaptive ray-launching process is used to shoot electromagnetic rays at targets in a simulated environment. Uniformly distributed sparse electromagnetic rays are launched at the targets and the angular ray densities relative to the targets are calculated. Several propagation paths that include multipath effects are considered to determine the angular ray densities. Based on the length of the propagation paths of sparse electromagnetic rays with multipath related to each target, denser electromagnetic rays can be launched. The denser electromagnetic rays enable the fidelity related to targets in a far-range to be similar to the fidelity of closer targets. Additionally, any sparse electromagnetics that cannot be detected by a sensor can be disregarded. In this manner, an efficient and accurate electromagnetic response model may be approximated.
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