The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 06, 2026
Filed:
Feb. 23, 2022
Bunge SA, Geneva, CH;
Rafael Monteiro Veras, Florianópolis, BR;
Artur Antonio Seibert, Florianópolis, BR;
André Luís Molgaro, Florianópolis, BR;
Flávio Gabriel Oliveira Barbosa, Florianópolis, BR;
Carlos Fernando Oliveira Cabeça Neves, Florianópolis, BR;
Renan Bonnard, Florianópolis, BR;
BUNGE SA, Geneva, CH;
Abstract
This invention describes a particle granulometry measurement system (), a collection, movement, and measurement system () and a grain particle granulometry measurement method run through a cracking process in order to define their particle granulometry and analyze its functioning. The grain particle granulometry measurement system () comprises an image collection device () configured to collect images from a plurality of grains; and a command unit () configured to receive images from the plurality of grains collected through the image collection device () and perform a particle granulometry measurement of the plurality of grains. The grain collection, movement and measurement system () comprises: a grain collection device (); the separator device (); a measurement device (); and a command unit (). The grain particle granulometry measurement method comprises the steps of: collecting () an image of the plurality of grains through image collection device; and measuring () the particle granulometry of each grain of the plurality of grains through the collected image.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile