The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 06, 2026

Filed:

Dec. 18, 2020
Applicant:

Hitachi High-tech Corporation, Tokyo, JP;

Inventors:

Takashi Anazawa, Tokyo, JP;

Ryoji Inaba, Tokyo, JP;

Shuhei Yamamoto, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 27/447 (2006.01); G01N 21/64 (2006.01);
U.S. Cl.
CPC ...
G01N 27/44721 (2013.01); G01N 21/64 (2013.01); G01N 27/44782 (2013.01); G01N 21/6456 (2013.01);
Abstract

A capillary array includes N analysis capillaries filled with a separation medium having a refractive index of nand used for electrophoretic analysis and N±1 lens capillaries filled with a medium having a refractive index of n4 and not used for the electrophoretic analysis, in which the N analysis capillaries and the N±1 lens capillaries are alternately arranged on the same array plane. When an outer diameter is defined as 2R, an inner diameter is defined as 2r, a refractive index of a medium of an outside is n, and a refractive index of a material is defined as nfor each of the N analysis capillaries and the N±1 lens capillaries, and when a refractive index ntakes any value within the range of 1.33≤n≤1.42, R, r, n, n, n, and nsatisfy a predetermined relationship, whereby the N analysis capillaries are efficiently simultaneously irradiated with the laser beam incident from a side of the array plane.


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