The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 06, 2026

Filed:

Apr. 22, 2024
Applicant:

Mloptic Corp, Redmond, WA (US);

Inventor:

Pengfei Wu, Bellevue, WA (US);

Assignee:

MLOptic Corp., Redmond, WA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01M 11/02 (2006.01); G01B 11/27 (2006.01);
U.S. Cl.
CPC ...
G01M 11/0221 (2013.01); G01B 11/272 (2013.01); G01M 11/0207 (2013.01); G01M 11/0257 (2013.01);
Abstract

An optical system for measuring a parallelism of rays of a light emitter and virtual imaging distances of the light emitter, including an enclosure including a front end and a rear end, a pair of apertures configured to be disposed on the front end of the enclosure on a central plane, a pair of first mirrors disposed interior of the enclosure; and a second mirror disposed interior of the enclosure, wherein the pair of apertures are configured to allow two sets of rays into the enclosure at the pair of first mirrors before being directed to the second mirror which redirects them to be cast as a first and second spots on an imaging plane, wherein a parallelism of the two sets of rays is based on a correspondence of a distance between the first and second spots with a distance between the two sets of rays.


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