The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 30, 2025

Filed:

Dec. 30, 2021
Applicant:

Lynred, Palaiseau, FR;

Inventors:

Nicolas Pere-Laperne, Grenoble, FR;

Alexandre Kerlain, Grenoble, FR;

Vincent Destefanis, Claix, FR;

Paul Fougeres, Veurey-Voroize, FR;

Assignee:

LYNRED, Palaiseau, FR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10F 77/123 (2025.01); H10F 30/221 (2025.01); H10F 30/223 (2025.01); H10F 71/00 (2025.01); H10F 77/00 (2025.01); H10F 77/14 (2025.01);
U.S. Cl.
CPC ...
H10F 77/1237 (2025.01); H10F 30/2212 (2025.01); H10F 30/223 (2025.01); H10F 71/00 (2025.01); H10F 71/1253 (2025.01); H10F 77/1233 (2025.01); H10F 77/148 (2025.01);
Abstract

A substrate to fabricate a photodiode structure has a top layer made from cadmium-doped semiconductor material. A first HgCdTe-base layer is formed by liquid phase epitaxy from the top layer with a bath containing an n-type electrically active dopant to electrically dope the first layer. The cadmium diffuses from the top layer to the first layer to form a decreasing cadmium concentration gradient from the interface with the top layer in a direction away from the interface. The cadmium concentration gradient causes a decreasing band gap width gradient in the first layer from the interface and causes an n-type dopant concentration gradient in the first layer from the interface.


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