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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12512364 B1

PDFFull Text
Date of Patent:
Dec. 30, 2025

Filed:

Dec. 01, 2023

Semiconductor memory device and manufacturing method thereof

Applicant:

SK Hynix Inc., Icheon-si, KR;

Inventor:

Nam Jae Lee, Cheongju, KR;

Assignee:

SK hynix Inc., Icheon-si, KR;

Attorneys:

AMPACC Law Group, PLLC

STEVE CHO

JAMES STROM

MICHAEL SMITH

DENNIS O'CONNOR

KEVIN RAUDEBAUGH

IM SEON SONG

JINCHUL HONG

Primary Examiner:

Jay C Chang

Int. Cl.
CPC ...
H10B 43/27 (2023.01); H01L 21/768 (2006.01); H10B 43/10 (2023.01);
U.S. Cl.
CPC ...
H01L 21/76816 (2013.01); H01L 21/76831 (2013.01); H01L 21/76877 (2013.01); H10B 43/27 (2023.02); H10B 43/10 (2023.02);
Abstract

A process of forming a 3D memory device includes forming a stacked structure with a plurality of stacked layers, etching the stacked structure to form stepped trenches each comprising a plurality of steps, forming a hard mask layer with a plurality of openings over the stepped trenches, forming a photoresist layer over the hard mask layer, and etching through the plurality of openings using the hard mask layer and the photoresist layers as an etch mask to extend a bottom of the stepped trenches to a lower depth.

Find Patent Forward Citations

Lee, Nam. (2025). Semiconductor memory device and manufacturing method thereof (U.S. Patent No. 12512364). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12512364

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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