The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 30, 2025

Filed:

Feb. 18, 2021
Applicant:

Evonik Operations Gmbh, Essen, DE;

Inventors:

Thomas Lammersen, Boeblingen, DE;

Benny Hartono, Singapur, SG;

Hans-Joachim Hasselbach, Gelnhausen, DE;

Danny De Corte, Sint-Niklaas, BE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G16C 20/10 (2019.01); B01D 53/14 (2006.01); B01D 53/34 (2006.01); B01D 53/58 (2006.01); G05B 19/4155 (2006.01); G16C 20/70 (2019.01);
U.S. Cl.
CPC ...
G16C 20/10 (2019.02); B01D 53/1412 (2013.01); B01D 53/346 (2013.01); B01D 53/58 (2013.01); G05B 19/4155 (2013.01); G16C 20/70 (2019.02); G05B 2219/32287 (2013.01);
Abstract

A method for controlling a chemical process, by preparing methanol, hydrogen sulfide, methyl mercaptan, hydrocyanic acid, acrolein, 3-methylthiopropionaldehyde, 5-(2-methylmercaptoethyl)-hydantoin, methionine, a salt of methionine, and a derivative of methionine. The method includes providing a training set TS, wherein TSis process values PVand process values PVbeing correlated to one another, and/or laboratory values LVand process values PVbeing correlated to one another. The method includes training a processing unit on the training set TSto identify a pattern of correlation between one or more measured process variables and at least one process variable. The method includes developing a calibration function CFfor a calibrated soft sensor from the identified pattern of correlation and predicting at least one operating parameter for the chemical process as an approximation to LVand/or PV. A system for controlling a chemical process.


Find Patent Forward Citations

Loading…