The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 30, 2025

Filed:

Jan. 24, 2022
Applicant:

Omron Corporation, Kyoto, JP;

Inventors:

Takeshi Shoji, Kyoto, JP;

Yoshiharu Tani, Kyoto, JP;

Adam Sowul, Pleasanton, CA (US);

Fred Schleifer, Spencer, NY (US);

Assignee:

OMRON CORPORATION, Kyoto, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01S 17/10 (2020.01); G01S 7/481 (2006.01); G01S 7/4865 (2020.01);
U.S. Cl.
CPC ...
G01S 17/10 (2013.01); G01S 7/4816 (2013.01); G01S 7/4817 (2013.01); G01S 7/4865 (2013.01);
Abstract

A laser scanner apparatus emits a laser pulse and monitors for pulse reflections, with the relative timing of a reflected pulse detected by the apparatus being translated into an object distance according to Time-of-Flight (ToF) measurements performed by the apparatus. According to an example configurations or an example method of operation, the apparatus adjusts its ToF determination for reflected pulses that are characterized as merged pulses formed by two or more overlapping reflected pulses. Among other advantages, the adjusted ToF determination yields a more accurate distance determination with respect to the earliest-arriving one(s) among the overlapping reflected pulses.


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