The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 30, 2025

Filed:

Apr. 07, 2022
Applicant:

3m Innovative Properties Company, St. Paul, MN (US);

Inventors:

Xuexue Guo, St. Paul, MN (US);

Henrik B. Van Lengerich, St. Paul, MN (US);

Joshua M. Fishman, Saint Louis Park, MN (US);

Karl K. Stensvad, Eagan, MN (US);

Cedric Bedoya, Woodbury, MN (US);

Caleb T. Nelson, McKinney, TX (US);

Kayla C. Niccum, Maplewood, MN (US);

John A. Wheatley, Stillwater, MN (US);

Jeffrey L. Solomon, Centerville, MN (US);

Johah Shaver, St. Paul, MN (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 33/52 (2006.01); G01N 21/64 (2006.01);
U.S. Cl.
CPC ...
G01N 21/6428 (2013.01); G01N 21/6456 (2013.01); G01N 33/525 (2013.01); G01N 2021/6439 (2013.01);
Abstract

Luminescent imaging films () for fluorescent enhancement and methods of making and using the same are provided. The films () include a flexible carrier layer (, and a pattern of photonic structure () disposed on the flexible carrier layer, which is interspersed with an anti-biofouling material () to provide a pattern of analyte sites (). The pattern of photonic structure includes a patterned high-refractive-index dielectric material surface () so as to provide resonance at the excitation or emission wavelength to enhance a fluorescence signal from labeled analytes.


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