The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 30, 2025

Filed:

Mar. 16, 2021
Applicant:

Sony Group Corporation, Tokyo, JP;

Inventors:

Koji Futamura, Tokyo, JP;

Naoki Morimoto, Tokyo, JP;

Takamichi Yamakoshi, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 21/64 (2006.01); G01N 15/14 (2024.01);
U.S. Cl.
CPC ...
G01N 21/64 (2013.01); G01N 15/14 (2013.01);
Abstract

A main objective of the present technology is to improve separation performance of a fluorescence spectrum. The present technology provides a particle analysis system including: a light irradiation unit including at least one first light source that emits light with a wavelength equal to or greater than 350 nm and at least one second light source that emits light with a wavelength less than 350 nm; and a processing unit configured to perform unmixing processing on light data obtained by irradiating particles with light by the light irradiation unit. In addition, the present technology also provides an information processing method including an unmixing processing step of performing unmixing processing on light data obtained by irradiating particles with light by a light irradiation unit including at least one first light source that emits light with a wavelength equal to or greater than 350 nm and at least one second light source that emits light with a wavelength less than 350 nm.


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