The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 30, 2025
Filed:
Jun. 13, 2022
Dai Nippon Printing Co., Ltd., Tokyo, JP;
Hideyuki Okamoto, Tokyo, JP;
Dai Nippon Printing Co., Ltd., Tokyo, JP;
Abstract
A mask apparatus may include a frame including first and second sides opposing each other in a first direction across an opening and third and fourth sides opposing each other in a second direction crossing the first direction across the opening. A manufacturing apparatus may include a pressing mechanism that presses the first and second sides toward the opening, a displacement measuring mechanism that measures amounts of deformation of the first and second sides in the first direction, and a fixing unit that fixes a mask to the first and second sides. The pressing mechanism may include five or more pressing units that are arranged at intervals of 500 mm or less in the second direction and that press the first side and five or more pressing units that are arranged at intervals of 500 mm or less in the second direction and that press the second side.