The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 30, 2025
Filed:
Aug. 29, 2022
Applicant:
Fujifilm Corporation, Tokyo, JP;
Inventors:
Fumiko Tsuna, Ashigarakami-gun, JP;
Toshihiro Kariya, Ashigarakami-gun, JP;
Shota Suzuki, Ashigarakami-gun, JP;
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C09D 11/54 (2014.01); B41M 5/00 (2006.01); C09D 11/033 (2014.01); C09D 11/107 (2014.01); C09D 11/40 (2014.01);
U.S. Cl.
CPC ...
C09D 11/54 (2013.01); B41M 5/0017 (2013.01); C09D 11/033 (2013.01); C09D 11/107 (2013.01); C09D 11/40 (2013.01);
Abstract
A pretreatment liquid for an impermeable base material includes an anionic resin, and an aqueous medium, in which the anionic resin has a C log P value of 1.40 or greater, and a content of a structural unit derived from an alkyl (meth)acrylate containing a chain alkyl group having 2 or more carbon atoms in the anionic resin is less than 5% by mass with respect to a total mass of the anionic resin.