The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 30, 2025

Filed:

Oct. 11, 2022
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventors:

Masahiro Tamura, Tochigi, JP;

Tosiya Asano, Tochigi, JP;

Atsushi Kimura, Saitama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 59/00 (2006.01); B29C 37/00 (2006.01); B29C 59/02 (2006.01);
U.S. Cl.
CPC ...
B29C 59/002 (2013.01); B29C 59/026 (2013.01); B29C 2037/903 (2013.01);
Abstract

An imprint apparatus that performs an imprint process of forming a pattern of an imprint material on a substrate using a mold, the apparatus including a control unit configured to control a mold driving unit and a substrate driving unit, and the imprint process including curing the imprint material, and releasing the mold from the cured imprint material, wherein the control unit includes a compensator configured to feedback-control driving of at least one of the mold driving unit and the substrate driving unit such that a positional relationship between the mold and the substrate in the releasing is maintained at a positional relationship between the mold and the substrate in the curing, and makes a gain of the compensator in the releasing smaller than a gain of the compensator in a step of the imprint process other than the releasing.


Find Patent Forward Citations

Tamura, Masahiro. (2025). Imprint apparatus and article manufacturing method (U.S. Patent No. 12508766). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12508766

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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