The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 30, 2025

Filed:

Dec. 03, 2024
Applicant:

Tela Bio, Inc., Malvern, PA (US);

Inventors:

Skott Greenhalgh, Gladwyne, PA (US);

John-Paul Romano, Chalfont, PA (US);

Assignee:

TELA Bio, Inc., Malvern, PA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61F 2/00 (2006.01); D05B 1/12 (2006.01); D05B 93/00 (2006.01);
U.S. Cl.
CPC ...
A61F 2/0063 (2013.01); D05B 1/12 (2013.01); D05B 93/00 (2013.01); A61F 2002/0068 (2013.01); A61F 2220/0075 (2013.01);
Abstract

Implants including stitching patterns that overlap to produce a corner-locked stitch pattern. An implant may include a substrate including a biocompatible material a reinforcing mesh sewn into the substrate. The reinforcing mesh may include a corner-stitch pattern that includes a first lock-stitch pattern and a second lock-stitch pattern. The first lock-stitch pattern may include a first upper thread and a first lower thread that interlace at a first thread interlace point. The second lock-stitch pattern may include a second upper thread and a second lower thread that interlace at a second thread interlace point. The second lock-stitch pattern may overlap the first lock-stitch pattern such that the second upper thread and the second lower thread envelop the first upper thread and the first lower thread adjacent to the first thread interlace point and the second thread interlace point.


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