The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 23, 2025

Filed:

Nov. 02, 2022
Applicant:

Epistar Corporation, Hsinchu, TW;

Inventors:

Chia-Ming Liu, Hsinchu, TW;

Chen Ou, Hsinchu, TW;

Jing-Jie Dai, Hsinchu, TW;

Shih-Wei Wang, Hsinchu, TW;

Chih-Ciao Yang, Hsinchu, TW;

Feng-Wen Huang, Hsinchu, TW;

Dian-Ying Hu, Hsinchu, TW;

Yu-Hsiang Yeh, Hsinchu, TW;

Assignee:

EPISTAR CORPORATION, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10H 20/812 (2025.01); F21K 9/232 (2016.01); H10H 20/814 (2025.01); H10H 20/815 (2025.01); H10H 20/825 (2025.01); H10H 20/833 (2025.01); H10H 20/841 (2025.01); H10H 20/856 (2025.01);
U.S. Cl.
CPC ...
H10H 20/812 (2025.01); H10H 20/8142 (2025.01); H10H 20/815 (2025.01); H10H 20/825 (2025.01); H10H 20/833 (2025.01); H10H 20/841 (2025.01); H10H 20/856 (2025.01); F21K 9/232 (2016.08);
Abstract

A light-emitting device includes a first nitride semiconductor structure; a stress relief structure on the first nitride semiconductor structure including a plurality of narrow band gap layers and a plurality of wide band gap layers alternately stacked, wherein one of the plurality of wide band gap layers includes a plurality of wide band gap sub-layers and one of the plurality of wide band gap sub-layers includes aluminum; an active structure on the stress relief structure including a plurality of quantum well layers and a plurality of barrier layers alternately stacked, wherein one of the plurality of barrier layers includes a plurality of barrier sub-layers and one of the plurality of barrier sub-layers includes aluminum, an aluminum composition of the wide band gap sub-layer is greater than or equal to that of the barrier sub-layer, and an average aluminum composition of the wide band gap layer is greater than that of the barrier layer; and an electron blocking structure on the active structure.


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