The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 23, 2025

Filed:

Feb. 16, 2021
Applicant:

Dowa Electronics Materials Co., Ltd., Tokyo, JP;

Inventors:

Yasuhiro Watanabe, Tokyo, JP;

Takehiko Fujita, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10H 20/812 (2025.01); H10H 20/01 (2025.01); H10H 20/816 (2025.01); H10H 20/825 (2025.01); H10H 20/83 (2025.01);
U.S. Cl.
CPC ...
H10H 20/812 (2025.01); H10H 20/0137 (2025.01); H10H 20/816 (2025.01); H10H 20/8252 (2025.01); H10H 20/83 (2025.01); H10H 20/825 (2025.01);
Abstract

A group III nitride semiconductor light-emitting element comprises, in the following order: an n-type group III nitride semiconductor layer; a group III nitride semiconductor laminated body obtained by alternately laminating a barrier layer and a well layer narrower in bandgap than the barrier layer in the stated order so that the number of barrier layers and the number of well layers are both N, where N is an integer; an AlN guide layer; and a p-type group III nitride semiconductor layer. The AlN guide layer has a thickness of 0.7 nm or more and 1.7 nm or less. A final barrier layer wider in bandgap than the well layer and narrower in bandgap than the AlN guide layer is provided between an Nth well layer in the group III nitride semiconductor laminated body and the AlN guide layer.


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