The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 23, 2025

Filed:

Jul. 08, 2022
Applicant:

Auo Corporation, Hsin-Chu, TW;

Inventors:

Yan-Liang Chen, Hsin-Chu, TW;

Tsu-Chien Tung, Hsin-Chu, TW;

Mei-Lien Huang, Hsin-Chu, TW;

Assignee:

AUO CORPORATION, Hsin-Chu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06V 40/13 (2022.01); G06V 10/147 (2022.01); H10F 39/00 (2025.01);
U.S. Cl.
CPC ...
G06V 40/1318 (2022.01); G06V 10/147 (2022.01); H10F 39/8033 (2025.01); H10F 39/8057 (2025.01);
Abstract

A biometric identification device is provided. Photosensitive devices are disposed on the substrate. The first dielectric layer is disposed on the photosensitive devices. The first light-shielding parts are disposed on the first dielectric layer. Each of the first light-shielding parts has a first light-transmitting area and a first light-shielding area surrounding the first light-transmitting area. The first light-transmitting area corresponds to and overlaps with the photosensitive device, and at least two of the first light-shielding parts are spaced apart by a spacer area. The second dielectric layer is disposed on the first light-shielding parts. The second light-shielding part is disposed on the second dielectric layer. An orthogonal projection of at least a part of the spacer area on the substrate is within an orthogonal projection of a second light-shielding area on the substrate.


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