The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 23, 2025
Filed:
May. 26, 2023
Shanghai Lilith Technology Corporation, Shanghai, CN;
SHANGHAI LILITH TECHNOLOGY CORPORATION, Shanghai, CN;
Abstract
The present invention is directed to a method, system, and device for combining models in a virtual scene, and to a coded storage medium in the field of two-dimensional (2D)/three-dimensional (3D) modeling which simplifies the work of the scene designer, reduces repetitive work, and achieves a desirable effect from the models. It includes: placing a first model into a second model; determining a filling space and a removing space of the first model; filling an overlapping space between the first model and the second model with the second model, and filling the filling space of the first model with the second model; and removing the second model with which the removing space of the first model is filled, wherein when the overlapping space between the first model and the second model is filled with the second model, and the filling space of the first model is filled with the second model, the removing space of the first model is filled with the second model.