The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 23, 2025
Filed:
Nov. 04, 2022
Tencent America Llc, Palo Alto, CA (US);
Haichao Zhu, Los Angeles, CA (US);
Bing Jian, Cupertino, CA (US);
Weiwei Feng, Mountain View, CA (US);
Lu He, Palo Alto, CA (US);
Kelin Liu, Thornhill, CA;
Shan Liu, San Jose, CA (US);
Tencent America LLC, Palo Alto, CA (US);
Abstract
A plurality of two-dimensional (2D) images of the scene is received. Geometric information and semantic information of each of the plurality of 2D images is determined. The geometric information indicates a detected line and a reference direction in the respective 2D image. The semantic information includes classification information of pixels in the respective 2D image. A layout estimation associated with the respective 2D image of the scene is determined based on the geometric information and the semantic information of the respective 2D image. A combined layout estimation associated with the scene is determined based on a plurality of the determined layout estimations associated with the plurality of 2D images of the scene. The Manhattan layout associated with the scene is generated based on the combined layout estimation. The Manhattan layout includes at least a three-dimensional (3D) shape of the scene that includes wall faces orthogonal with respect to each other.