The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 23, 2025
Filed:
Jun. 01, 2023
Qualcomm Incorporated, San Diego, CA (US);
Jisoo Jeong, San Diego, CA (US);
Hong Cai, San Diego, CA (US);
Risheek Garrepalli, San Diego, CA (US);
Fatih Murat Porikli, San Diego, CA (US);
Mathew Sam, San Diego, CA (US);
Khalid Tahboub, San Diego, CA (US);
Bing Han, San Diego, CA (US);
QUALCOMM Incorporated, San Diego, CA (US);
Abstract
Systems and techniques are provided for generating disparity information from two or more images. For example, a process can include obtaining first disparity information corresponding to a pair of images, the pair of images including a first image of a scene and a second image of the scene. The process can include obtaining confidence information associated with the first disparity information. The process can include processing, using a machine learning network, the first disparity information and the confidence information to generate second disparity information corresponding to the pair of images. The process can include combining, based on the confidence information, the first disparity information with the second disparity information to generate a refined disparity map corresponding to the pair of images.