The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 23, 2025
Filed:
Apr. 13, 2022
Applicant:
Samsung Electronics Co., Ltd., Suwon-si, KR;
Inventors:
Dahan Kang, Seongnam-si, KR;
Youngseok Kim, Osan-si, KR;
Assignee:
SAMSUNG ELECTRONICS CO., LTD., Suwon-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G05B 19/401 (2006.01); G05B 19/418 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
G03F 7/705 (2013.01); G03F 7/70625 (2013.01); G05B 19/401 (2013.01); G05B 19/41885 (2013.01); G05B 2219/37224 (2013.01);
Abstract
A method for monitoring a process variation index includes operations of: obtaining a target parameter to be monitored and a reference parameter used to increase goodness of fit among structural parameters predicted by measuring a structure in a specific location of a wafer; obtaining a reference parameter set in a reference model; and calculating a process variation index capable of confirming a structural change of the structure according to a change in process conditions using the structural parameter and the reference parameter.