The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 23, 2025

Filed:

Sep. 28, 2022
Applicant:

Arakawa Chemical Industries, Ltd., Osaka, JP;

Inventors:

Takashi Yamaguchi, Osaka, JP;

Taiyou Nakamura, Osaka, JP;

Atsushi Shiotani, Osaka, JP;

Keisuke Sugimoto, Osaka, JP;

Madoka Yamashita, Osaka, JP;

Takashi Tasaki, Osaka, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/037 (2006.01); C08G 73/10 (2006.01); C08L 79/08 (2006.01);
U.S. Cl.
CPC ...
G03F 7/037 (2013.01); C08G 73/1039 (2013.01); C08G 73/1046 (2013.01); C08L 79/08 (2013.01);
Abstract

A curable photosensitive resin composition which can be cured at a relatively low temperature, has excellent developability and adhesion to a support, and a cured product that realizes low dielectric constant properties. A curable photosensitive resin composition containing a polyimide resin (A) which is a reaction product of monomer groups containing an aromatic tetracarboxylic anhydride (a1) and a diamine (a2) containing a dimer diamine, maleimides (B), and a polyfunctional polymerizable compound (C) having two or more ethylenic double bonds other than the component (A) and the component (B), a cured product, a photosensitive element, a resist pattern, a method of producing a resist pattern, a semiconductor device and an electronic device.


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