The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 23, 2025
Filed:
May. 25, 2023
Semes Co., Ltd., Cheonan-si, KR;
Hark Ryong Kim, Cheonan-si, KR;
SEMES CO., LTD., Chungcheongnam-do, KR;
Abstract
The present invention relates to an inspection apparatus and an inspection method which selectively adjust a numerical aperture of illuminating light in the form of collimated light when inspecting a target object, such as a wafer or the like, using a spectrum, thereby preventing a diffraction phenomenon caused by the illuminating light. The inspection apparatus may include: a camera unit disposed above a target object; an illumination unit configured to illuminate the target object with illuminating light; and a light detection unit configured to detect reflection light of the target object illuminated with the illuminating light, wherein the illumination unit comprises a numerical aperture adjustment device which has a first optical member having a first numerical aperture that is replaceable with a second optical member having a second numerical aperture different from the first numerical aperture so as to reduce a diffraction phenomenon caused by the illuminating light.