The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 23, 2025

Filed:

Apr. 30, 2024
Applicant:

Kokusai Electric Corporation, Tokyo, JP;

Inventors:

Takuya Joda, Toyama, JP;

Yukinao Kaga, Toyama, JP;

Yoshimasa Nagatomi, Toyama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/30 (2006.01); C23C 16/52 (2006.01); H01L 21/285 (2006.01); H10B 43/27 (2023.01);
U.S. Cl.
CPC ...
C23C 16/45557 (2013.01); C23C 16/303 (2013.01); C23C 16/52 (2013.01); H01L 21/28568 (2013.01); H10B 43/27 (2023.02);
Abstract

Described herein is a technique capable of improving characteristics of a film. According to one or more embodiments of the present disclosure, there is provided a technique that includes: (a) performing (a-1) supplying in parallel a metal-containing gas and a reducing gas that contains silicon and hydrogen and is free of halogen to a substrate in a process chamber, and (a-2) exhausting an inner atmosphere of the process chamber; (b) repeatedly performing (a) a first number of times; (c) supplying a nitrogen-containing gas to the substrate in the process chamber and exhausting the inner atmosphere of the process chamber after performing (b); and (d) repeatedly performing (a) a second number of times.


Find Patent Forward Citations

Loading…