logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12503587 B1

PDFFull Text
Date of Patent:
Dec. 23, 2025

Filed:

Mar. 25, 2021

Novolak resin, epoxy resin, photosensitive resin composition, curable resin composition, cured substance, electronic device, production method for novolak resin, and production method for epoxy resin

Applicant:

Central Glass Company, Limited, Ube, JP;

Inventors:

Kensuke Hirotaki, Kawagoe, JP;

Yukari Hara, Kawagoe, JP;

Takashi Aoki, Kawagoe, JP;

Hirokatsu Nagura, Kawagoe, JP;

Kenji Hosoi, Kawagoe, JP;

Assignee:

Central Glass Company, Limited, Ube, JP;

Attorney:

Crowell & Moring LLP

Primary Examiner:

Ha S Nguyen

Int. Cl.
CPC ...
C08L 63/04 (2006.01); C08F 299/02 (2006.01); C08G 8/28 (2006.01); C08G 59/06 (2006.01); C08G 59/08 (2006.01); C08G 59/24 (2006.01); C08G 59/30 (2006.01); C08G 59/32 (2006.01); C08G 59/42 (2006.01); C08G 59/62 (2006.01); C08G 59/68 (2006.01); G03F 7/00 (2006.01); G03F 7/023 (2006.01); G03F 7/038 (2006.01); H05K 3/28 (2006.01);
U.S. Cl.
CPC ...
C08L 63/04 (2013.01); C08G 59/245 (2013.01); C08G 59/308 (2013.01); C08L 2203/20 (2013.01);
Abstract

A novolak resin including a partial structure represented by —C(CF)H—. In addition, there are provided a photosensitive resin composition containing the above-described novolak resin and a photosensitizing agent. In addition, there is provided an epoxy resin having a partial structure represented by —C(CF)H—. In addition, there is provided a curable resin composition containing the novolak resin or the epoxy resin. In addition, there is provided a cured substance obtained by curing the composition. In addition, there is provided a production method for a novolak resin, including reacting an aromatic compound with fluoral in a presence of an acid catalyst to produce a novolak resin having a partial structure represented by —C(CF)H—. Further, there is provided a production method for an epoxy resin, including an epoxidation step of reacting a novolak resin having a partial structure represented by —C(CF)H— with epihalohydrin in a presence of a base.

Find Patent Forward Citations

Loading…