The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 23, 2025

Filed:

Feb. 22, 2022
Applicant:

Ineos Styrolution Group Gmbh, Frankfurt am Main, DE;

Inventors:

Norbert Niessner, Friedelsheim, DE;

Bianca Wilhelmus, Hanau, DE;

Achim Schmidt-Rodenkirchen, Bayreuth, DE;

Konstantin Mierdel, Bayreuth, DE;

Assignee:

INEOS STYROLUTION GROUP GMBH, Frankfurt am Main, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07C 4/22 (2006.01);
U.S. Cl.
CPC ...
C07C 4/22 (2013.01);
Abstract

A process for producing styrene monomers from styrene oligomers comprises the following steps: a) providing a composition (A) comprising at least one type of styrene oligomer, wherein the composition (A) comprises at least 15 wt.-% of styrene dimers and/or styrene trimers; b) providing a depolymerization reactor (R) with a reaction zone (Z); c) feeding the composition (A) into the reaction zone (Z) of the reactor (R); d) depolymerizing the at least one type of styrene oligomer in the reaction zone (Z) to obtain a composition (B), comprising styrene monomers; e) removing the composition (B) from the reaction zone (Z); and f) isolating the styrene monomers from the composition (B); wherein the temperature (T) inside the reaction zone (Z) is above 500° C. to below 800° C. and the average residence time (tA) of the composition (A) in the reaction zone (Z) is greater than 0.01 s and less than 60 s.


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