The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 23, 2025
Filed:
Jan. 06, 2022
Hitachi High-tech Corporation, Tokyo, JP;
Mayuko Ito, Tokyo, JP;
Shinya Matsuoka, Tokyo, JP;
HITACHI HIGH-TECH CORPORATION, Tokyo, JP;
Abstract
An evaporation concentration mechanism is realized that can control a depressurization rate by an inexpensive and simple mechanism to inhibit bumping at the time of evaporation and concentration. The evaporation concentration mechanism includes a reaction vessel that holds a sample solution, a depressurization channel connected to the reaction vessel, and a depressurization source that is connected to the reaction vessel via the depressurization channel and depressurizes the inside of the reaction vessel. The evaporation concentration mechanism further includes at least one of solenoid valves provided in the depressurization channel, and a control unitthat controls an operation of the solenoid valves. The control unitintermittently opens and closes the solenoid valves during a depressurization period in which the inside of the reaction vessel is depressurized by the depressurization source.