The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 16, 2025

Filed:

Sep. 03, 2021
Applicant:

Mitsubishi Electric Corporation, Tokyo, JP;

Inventors:

Takahiro Nakatani, Tokyo, JP;

Tetsuya Nitta, Tokyo, JP;

Koichi Nishi, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10D 12/00 (2025.01); H10D 62/17 (2025.01); H10D 84/80 (2025.01);
U.S. Cl.
CPC ...
H10D 12/481 (2025.01); H10D 62/177 (2025.01); H10D 84/811 (2025.01);
Abstract

A semiconductor device includes an insulated gate bipolar transistor region having a base layer of a second conductivity type provided in a surface layer of the semiconductor substrate on a first main surface side, an emitter layer of a first conductivity type having an impurity concentration higher than that of a drift layer selectively provided in the surface layer of the base layer on the first main surface side, a plurality of gate electrodes facing the emitter layer, the base layer, and the drift layer via gate insulating films, a counter-doped layer, having an impurity concentration of the second conductivity type higher than that of the base layer and an impurity concentration of the first conductivity type higher than that of the drift layer, and a collector layer of the second conductivity type provided in the surface layer of the semiconductor substrate on a second main surface side.


Find Patent Forward Citations

Loading…