The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 16, 2025

Filed:

Mar. 31, 2021
Applicant:

Qualcomm Incorporated, San Diego, CA (US);

Inventors:

Huilin Xu, Temecula, CA (US);

Qunfeng He, San Diego, CA (US);

Yuwei Ren, Beijing, CN;

Assignee:

QUALCOMM Incorporated, San Diego, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H04L 1/00 (2006.01); H04W 72/0446 (2023.01); H04W 72/1273 (2023.01); H04W 72/23 (2023.01); H04W 72/541 (2023.01);
U.S. Cl.
CPC ...
H04W 72/541 (2023.01); H04W 72/0446 (2013.01); H04W 72/1273 (2013.01); H04W 72/23 (2023.01);
Abstract

In methods and devices configured to perform the methods for managing downlink traffic reception and cross-link interference (CLI), a wireless device may receive from a base station physical downlink control channel (PDCCH) traffic using a first receive (Rx) resource tuning of an Rx resource, determine whether a time period between an end of the PDCCH traffic and a beginning of a CLI measurement opportunity exceeds a threshold duration for tuning the Rx resource to a second Rx resource tuning, and may receive downlink traffic using the first Rx resource tuning in response to determining that the time period between the end of the PDCCH traffic and the beginning of the CLI measurement opportunity is less than or equal to the threshold duration.


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