The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 16, 2025

Filed:

Feb. 09, 2021
Applicant:

Sony Semiconductor Solutions Corporation, Kanagawa, JP;

Inventors:

Yoshiteru Tachikawa, Kumamoto, JP;

Shinichi Agatuma, Kumamoto, JP;

Masato Ogawa, Kumamoto, JP;

Hitoshi Domon, Kumamoto, JP;

Masato Oishi, Kumamoto, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01S 5/183 (2006.01);
U.S. Cl.
CPC ...
H01S 5/18361 (2013.01); H01S 5/18327 (2013.01); H01S 5/18347 (2013.01); H01S 5/18311 (2013.01); H01S 5/18358 (2013.01);
Abstract

Provided is a surface emitting laser that includes a first multilayer film reflector, a second multilayer film reflector, and an active layer between the first multilayer film reflector and the second multilayer film reflector. In at least one of the first multilayer film reflector or the second multilayer film reflector, a high-concentration impurity region having a higher impurity concentration than other regions is partially provided in a thickness direction. According to the present technology, there is provided a surface emitting laser capable of reducing resistance while suppressing a decrease in manufacturing efficiency.


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