The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 16, 2025
Filed:
Mar. 27, 2023
Tencent America Llc, Palo Alto, CA (US);
TENCENT AMERICA LLC, Palo Alto, CA (US);
Abstract
A method including receiving, at an encoder, a first original polygonal mesh and a second distorted polygonal mesh, the first original polygonal mesh being an original polygonal mesh and the second polygonal mesh being a distorted polygonal mesh; converting the first polygonal mesh and the second polygonal mesh into two or more triangle meshes by subdividing the plurality of polygon faces of each of the first polygonal mesh and the second polygonal mesh into a plurality of triangle faces; sampling a plurality of points on each of the plurality of triangle faces from both the first and the second polygonal meshes; generating at least a first sampled point cloud for one of the first or the second polygonal mesh using the sampled plurality of points; and computing a geometry and attribute distortion profile between the first and the second polygonal meshes based on at least the first sampled point cloud.