The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 16, 2025
Filed:
May. 22, 2023
Dell Products L.p., Hopkinton, MA (US);
Gajanan S. Natu, Cary, NC (US);
Vasudevan Subramanian, Chapel Hill, NC (US);
Dmitry Tylik, Westborough, MA (US);
Vamsi K. Vankamamidi, Hopkinton, MA (US);
Dell Products L.P., Hopkinton, MA (US);
Abstract
In at least one embodiment, a method can include: establishing a bi-directional synchronous replication configuration for a stretched resource configured across first and second sites; determining a first difference between a first maximum normalized total I/O workload of the first site and a first current normalized total I/O workload of the first site without including read I/O workload of the stretched resource; determining a second difference between a second maximum normalized total I/O workload of the second site and a second current normalized total I/O workload of the second site without including read I/O workload of the stretched resource; and selecting, in accordance with the first difference and the second difference, only one of the first site and the second site to receive and service subsequent read and write I/Os directed to the stretched resource. The configuration can be equidistant with respect to a host and the stretched resource.