The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 16, 2025
Filed:
Jan. 12, 2024
Applicant:
Authentix, Inc., Addison, TX (US);
Inventors:
Milad Khoshnegar Shahrestani, Coquitlam, CA;
Ripon Dey, Maple Ridge, CA;
Assignee:
Authentix, Inc., Addison, TX (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G03F 7/30 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
G03F 7/704 (2013.01); G03F 7/0005 (2013.01); G03F 7/30 (2013.01); H01J 37/32082 (2013.01); H01J 37/32449 (2013.01); H01J 2237/3341 (2013.01);
Abstract
A method for patterning a substrate involves depositing a layer of resist material on a surface of the substrate, lithographically patterning (electron beam exposing and then developing) the layer of the resist material to form a patterned resist layer having a pattern multi-faceted microscale structures with a depth profile that varies over an area of the layer of resist material, and using the patterned resist layer in an etching step to transfer the pattern of multi-faceted microscale structures from the patterned resist layer to the substrate.